Fabrication and characterisation of Ni nanocontacts

被引：9

作者：

Céspedes, O

Bari, MA

Dennis, C

Versluijs, JJ

Jan, G

O'Sullivan, J

Gregg, JF

Coey, JMD

机构：

[1] Univ Dublin Trinity Coll, Dept Phys, Dublin 2, Ireland

[2] Univ Oxford, Clarendon Lab, Oxford OX1 3PU, England

[3] Trikon Technol Inc, Newport NP18 2TA, Gwent, Wales

来源：

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 2002年 / 242卷 / PART I期

基金：

爱尔兰科学基金会;

关键词：

sputtering; ferromagnetic films; ferromagnetic-nanoscale; electrodeposition;

D O I：

10.1016/S0304-8853(01)01053-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We propose a simple method to make metallic nanocontacts. A gap is electrochemically etched in a Ni track. The gap resistance is monitored as material is redeposited from the solution to bridge the gap. I:V characteristics were compared with those of Ni nanocontacts fabricated using a focussed ion beam (FIB). The I:V characteristic is asymmetric above 200 K in both cases. (C) 2002 Published by Elsevier Science B.V.

引用

页码：492 / 494

页数：3

共 6 条

[1] ASYMMETRY IN THE MAGNETOCONDUCTANCE OF METAL WIRES AND LOOPS [J].