The response of a NiOx thin film to a step potential and its electrochromic mechanism

被引：55

作者：

Jiang, SR ^{[1
]}

Yan, PX ^{[1
]}

Feng, BX ^{[1
]}

Cai, XM ^{[1
]}

Wang, J ^{[1
]}

机构：

[1] Lanzhou Univ, Dept Phys, Lanzhou 730000, Peoples R China

来源：

MATERIALS CHEMISTRY AND PHYSICS | 2003年 / 77卷 / 02期

基金：

中国国家自然科学基金;

关键词：

NiOx film; electrochromic properties; electrochemical mechanism;

D O I：

10.1016/S0254-0584(02)00010-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The response of an RF sputtered NiOx thin film to step potential and its electrochromic mechanism have been investigated. It was found that the NiOx films manifested fine electrochromic properties. Bleaching and coloration did not cause the change of the film's structure. The NiOx films are non-stoichoimetric with Ni vacancies. It is suggested that the bleaching and coloration reaction of the NiOx films in a KOH solution occurs along the grain boundaries. The physical absorption of colored NiOx films is caused by the intraband absorbance of the t(2g) level of the Ni3+ ion. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：384 / 389

页数：6

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