Efficiency potential of thin film polycrystalline silicon solar cells by silane-gas-free process using aluminum-induced-crystallization

被引:5
作者
Ito, T
Fukushima, H
Yamaguchi, M
机构
[1] Toyota Cent Res & Dev Labs Inc, Nagakute, Aichi 4801192, Japan
[2] Toyota Technol Inst, Nagoya, Aichi 4688511, Japan
关键词
polycrystalline silicon thin film; solar cell; silane-gas-free process; aluminum-induced-crystallization; efficiency simulation;
D O I
10.1016/j.solmat.2004.02.015
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
Analyzing the performance of thin film polycrystalline silicon solar cells fabricated by silane-gas-free process including the aluminum-induced-crystallization technique by using the device simulation program "PC1D", we have estimated the efficiency of them. In addition, we have discussed the issues to make the silane-gas-free process practical. In the cell fabrication by silane-gas-free process, segregation of impurity atoms at the grain boundaries of the Si film is one of the serious problems. By suppressing the impurity inclusion and optimizing the cell parameters, the simulated efficiency is to be about 13% in single-junction cells. (C) 2004 Elsevier B.V. All rights reserved.
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页码:91 / 99
页数:9
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