Adhesion of diamond films on Ti-6Al-4V alloys

Diamond films have been successfully grown on Ti (Al 6%, V 4%) alloy by hot filament chemical vapor deposition (HFCVD). Different gas mixtures of methane to hydrogen and substrate temperatures were used in order to deposit high quality diamond films. Scanning electron microscopy (SEM), X-ray diffraction, Raman spectroscopy, and microhardness measurements have been used to characterize the diamond films, The results indicate that uniform high quality diamond films can be grown on the titanium alloy at a partial pressure of 2660 Pa, ratio of methane to hydrogen of 0.5-1%, filament temperature 2273 K, and substrate temperature 1073 K. The hardness of the Ti alloy is increased 30% by coating with the diamond film. The adhesion measurements indicate that diamond films grown on the Ti alloy have excellent adhesion.