Density of thin TiO2 films

被引：53

作者：

Laube, M ^{[1
]}

Rauch, F ^{[1
]}

Ottermann, C ^{[1
]}

Anderson, O ^{[1
]}

Bange, K ^{[1
]}

机构：

[1] SCHOTT GLASWERKE FORSCH & ENTWICKLUNG,D-55127 MAINZ,GERMANY

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1996年 / 113卷 / 1-4期

关键词：

D O I：

10.1016/0168-583X(95)01331-8

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Thin oxide films have a broad range of applications in optical devices. Titania (TiO2) is a frequently used oxide material for optical coatings because of its high refractive index (approximate to 2.4) and low absorption. The development of devices and optimization of production parameters require proper knowledge of the film properties, such as refractive index, composition, contaminations and density. In thin-film analysis, RBS is usually employed for the determination of the film stoichiometry and contaminations. We have used a combination of RBS analysis and optical measurements to deduce absolute values for the density of thin films. Results for thin TiO2 films are presented demonstrating the usefulness of this approach. A strong correlation of density and refractive index is found. The density values are compared with data gained by X-ray reflection spectrometry. The differences of the density values obtained by both techniques are discussed, focusing on the uncertainties of the He-4 stopping power values.

引用

页码：288 / 292

页数：5

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