Stability of oriented silicalite-1 films in view of zeolite membrane preparation

被引：108

作者：

denExter, MJ

vanBekkum, H

Rijn, CJM

Kapteijn, F

Moulijn, JA

Schellevis, H

Beenakker, CIN

机构：

[1] DELFT UNIV TECHNOL,DELFT INST MICROELECT & SUBMICRONTECHNOL,DIMES,DELFT,NETHERLANDS

[2] DELFT UNIV TECHNOL,DEPT CHEM ENGN,DELFT,NETHERLANDS

[3] UNIV TWENTE,NL-7500 AE ENSCHEDE,NETHERLANDS

[4] MESA RES INST,ENSCHEDE,NETHERLANDS

来源：

ZEOLITES | 1997年 / 19卷 / 01期

关键词：

orientation; nonsupported; silicalite-1; tensile stress; compressive stress; etching; zeolite membranes; sensors;

D O I：

10.1016/S0144-2449(97)00044-4

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Silicalite-1 is grown as b- and (a, b)-oriented monolayers on silicon wafers and on silicon wafers containing low-stress silicon nitride windows, aiming at two new membrane systems. The orientation of crystals determines the stability (crack formation), due to tensile or compressive stress, imposed on the layer after removal of the organic template. By application of etching procedures, the nitride support can be removed, leaving the crystal layer undamaged. The latter makes preparation of oriented and nonsupported thin layers for gas separation purposes possible. (C) Elsevier Science Inc. 1997.

引用

页码：13 / 20

页数：8

共 24 条

[1] Permeation characteristics of a metal-supported silicalite-1 zeolite membrane [J].