Photoreversibly switchable superhydrophobic surface with erasable and rewritable pattern

被引：320

作者：

Lim, Ho Sun ^{[1
]}

Han, Joong Tark ^{[1
]}

Kwak, Donghoon ^{[1
]}

Jin, Meihua ^{[1
]}

Cho, Kilwon ^{[1
]}

机构：

[1] Pohang Univ Sci & Technol, Dept Chem Engn, Pohang 790784, South Korea

来源：

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 2006年 / 128卷 / 45期

关键词：

D O I：

10.1021/ja0655901

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

We report the facile fabrication of a functional nanoporous multilayer film with wettability that is reversibly tunable between superhydrophobicity and superhydrophilicity with UV/visible irradiation. Our approach controls surface roughness with an electrostatic self-assembly process and makes use of the photoresponsive molecular switching of fluorinated azobenzene molecules. Selective UV irradiation onto the nanostructured substrate was used to realize substrates with erasable and rewritable patterns of extreme wetting properties. Our findings will open up new avenues for external stimuli-responsive smart surfaces. Copyright © 2006 American Chemical Society.

引用

页码：14458 / 14459

页数：2

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