共 17 条
[1]
ALLEN RD, 1993, SOLID STATE TECHNOL, V35, P53
[2]
BEDNAR B, 1993, RESISTS MICROLITHOGR, V76
[3]
Fabrication limits of electron beam lithography and of UV, X-ray and ion-beam lithographies
[J].
PHILOSOPHICAL TRANSACTIONS OF THE ROYAL SOCIETY A-MATHEMATICAL PHYSICAL AND ENGINEERING SCIENCES,
1995, 353 (1703)
:291-311
[4]
CERRINA F, 1995, SPIE HDB LITHOGRAPHY
[5]
HOHN FJ, 1994, NATO ADV SCI INST SE, V264, P1
[6]
*I MICR CETEHOR, 1991, RECH MICR REAL PERP
[7]
Jain K., 1990, EXCIMER LASER LITHOG
[8]
LAMOLA AA, 1991, SOLID STATE TECH AUG, P54
[9]
OBERAI AS, 1987, SOLID STATE TECHNOL, V30, P123
[10]
QUEISSER HJ, 1977, APPL SOLIDS