Self-assembling of atomic vacancies at an oxide/intermetallic alloy interface

被引:100
作者
Maurice, V
Despert, G
Zanna, S
Bacos, MP
Marcus, P
机构
[1] Ecole Natl Super Chim Paris, ENSCP, CNRS,UMR 7045, Lab Physicochim Surfaces, F-75231 Paris 05, France
[2] Off Natl Etud & Rech Aerosp, Dept Mat Met & Proc, F-92322 Chatillon, France
关键词
D O I
10.1038/nmat1203
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Oxide layers grown on the surface provide an effective way of protecting metallic materials against corrosion for sustainable use in a broad range of applications(1-3). However, the growth of cavities at the metal/oxide interface weakens the adherence of the protective layer and can promote its spallation under service conditions, as observed for alumina layers formed by selective oxidation of aluminide intermetallic alloys(4-8) used in high-temperature applications. Here we show that direct atomic-scale observations of the interface between an ultrathin protective oxide layer (alumina) grown on an intermetallic titanium aluminide substrate (TiAl) can be performed with techniques sensitive to the topmost atomic layers at the surface. Nanocavities resulting from the self-assembling of atomic vacancies injected at the interface by the growth mechanism of the protective oxide are observed for the first time, bringing new insight into the understanding of the fate of injected cavities in oxidation processes.
引用
收藏
页码:687 / 691
页数:5
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