The structural transformation of the Pt(110) electrode during the Cu underpotential deposition process

被引：8

作者：

Endo, O ^{[1
]}

Ikemiya, N ^{[1
]}

Ito, M ^{[1
]}

机构：

[1] Keio Univ, Dept Chem, Fac Sci & Technol, Yokohama, Kanagawa 2238522, Japan

来源：

SURFACE SCIENCE | 2002年 / 514卷 / 1-3期

关键词：

platinum; copper; scanning tunneling microscopy; infrared absorption spectroscopy; growth;

D O I：

10.1016/S0039-6028(02)01635-7

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The underpotential deposition (UPD) of copper on the Pt(110) electrode in 0.5 M H2SO4 was studied by in situ scanning tunneling microscopy and IRAS. It was revealed that UPD copper produces the (1 x 1) structure as long as the sample potential is kept below 670 mV (vs. standard hydrogen electrode, SHE). After potential cycles over 60 min at the range of 220-1070 mV (vs. SHE), the surface is irreversibly transformed into the (1 x n) reconstructed structure. The UPD copper traces the substrate (1 x n). The irregular band shift of the SO4 stretching mode observed by IRAS is also discussed. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：234 / 240

页数：7

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