Controlled electroless deposition of noble metal nanoparticle films on germanium surfaces

被引：202

作者：

Porter, LA ^{[1
]}

Choi, HC ^{[1
]}

Ribbe, AE ^{[1
]}

Buriak, JM ^{[1
]}

机构：

[1] Purdue Univ, Dept Chem, Brown Labs Chem 1393, W Lafayette, IN 47907 USA

来源：

NANO LETTERS | 2002年 / 2卷 / 10期

关键词：

D O I：

10.1021/nl025677u

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Thin noble metal films have been prepared as a result of the immersion of germanium substrates into dilute, aqueous solutions of AuCl4-, PdCl42-, or PtCl42-, respectively. Deposition proceeds via galvanic displacement in the absence of fluoride, pH adjusters, complexing agents, or external reducing agents. This manner of metal deposition serves as a cost-effective, high-throughput methodology with control over surface morphology and deposition rate by modulation of plating parameters such as concentration, temperature, and immersion time.

引用

页码：1067 / 1071

页数：5

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