A 5-V operated MEMS variable optical attenuator by SOI bulk micromachining

被引：119

作者：

Isamoto, K ^{[1
]}

Kato, K

Morosawa, A

Chong, CH

Fujita, H

Toshiyoshi, H

机构：

[1] Santec Corp, Aichi 4850802, Japan

[2] Univ Tokyo, Inst Ind Sci, Tokyo 1538505, Japan

来源：

IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS | 2004年 / 10卷 / 03期

关键词：

microelectromechanical systems (MEMS); optical MEMS; variable optical attenuator (VOA);

D O I：

10.1109/JSTQE.2004.828475

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We report the design, fabrication, and successful demonstration of microelectromechanical variable optical attenuator (VOA) using an electrostatic microtorsion mirror (0.6 mm in diameter) combined with a fiber-optic collimator. The VOA operates at low voltages (dc 5 V or less) for large optical attenuation (40 dB, corresponding to mirror angle of 0.3degrees) and a, fast response time (5 ms or faster). The mirror made of a bulk-micromachined silicon-on-insulator wafer has been designed to be shock resistant up to 500 G without any mechanical failure. We also have suppressed temperature dependence of optical performance to be less than +/-0.5 dB at 10-dB attenuation in the range of -5degreesC-70degreesC by mechanically decoupling the parasitic bimorph effect fro m the electrostatic operation.

引用

页码：570 / 578

页数：9

共 11 条

[1] Low insertion loss packaged and fibre connectorised MEMS reflective optical switch [J].