Throwing power during electrophoretic deposition

被引:6
作者
Anne, Guy [1 ]
Neirinck, Bram [1 ]
Vanmeensel, Kim [1 ]
Van der Biest, Omer [1 ]
Vleugels, Jef [1 ]
机构
[1] Katholieke Univ Leuven, Dept Met & Mat Engn, B-3001 Heverlee, Belgium
来源
ELECTROPHORETIC DEPOSITION: FUNDAMENTALS AND APPLICATIONS II | 2006年 / 314卷
关键词
electrophoretic deposition; throwing power; alumina;
D O I
10.4028/www.scientific.net/KEM.314.187
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 [材料科学与工程]; 080502 [材料学];
摘要
The deposit can induce an extra potential drop near the electrode, depending on the suspension composition. This can result in a levelling off of the deposition rate in a constant-voltage deposition process. The magnitude of the extra voltage drop determines the uniformity of the deposit as function of the uniformity of the electric field present at the deposition electrode. It was experimentally proven that a uniform Al(2)O(3) coating thickness was obtained in a non-homogeneous electrical field in ethanol with addition of HNO(3), while the coating thickness varied uniformly with the E-field strength for a MEK with n-butylamine based suspension. The uniformity of the coating deposited from these suspensions was related to the measured potential drop over the deposit during electrophoretic deposition.
引用
收藏
页码:187 / 191
页数:5
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