arc evaporation;
direct current (d.c.);
filtered arc;
PAPVD;
pulsed;
D O I:
10.1016/S0257-8972(99)00460-0
中图分类号:
TB3 [工程材料学];
学科分类号:
0805 ;
080502 ;
摘要:
A major obstacle for the broad application of cathodic are plasma deposition is the presence of micro- and nanoparticles in the plasma, also often referred to as 'macroparticles'. This paper reviews the formation of macroparticles at cathode spots, their interaction with the are plasma and substrate, and macroparticle separation and removal from the plasma by various filtering methods. Nineteen variants of filters are discussed, including Aksenov's classic 90 degrees-duct filter, filters of open architecture, and the concept of stroboscopic filtering. (C) 1999 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:319 / 330
页数:12
相关论文
共 77 条
[1]
AHARONOV R, 1999, INT C MET COAT THIN
[2]
AKSENOV II, 1978, INSTRUM EXP TECH+, V21, P1416