Measurement of femtosecond laser-induced damage and ablation thresholds in dielectrics

被引：107

作者：

Sanner, N. ^{[1
]}

Uteza, O. ^{[1
]}

Bussiere, B. ^{[1
,2
]}

Coustillier, G. ^{[1
]}

Leray, A. ^{[1
]}

Itina, T. ^{[1
]}

Sentis, M. ^{[1
]}

机构：

[1] Univ Aix Marseille 2, CNRS, UMR 6182, Lab LP3, F-13288 Marseille 9, France

[2] Amplitude Technol, CE2926, F-91029 Evry, France

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2009年 / 94卷 / 04期

关键词：

TRANSPARENT MATERIALS; INDUCED BREAKDOWN; OPTICAL-BREAKDOWN; FUSED-SILICA; PULSE DURATION; DYNAMICS; NANOSECOND; IONIZATION; ABSORPTION; LENSES;

D O I：

10.1007/s00339-009-5077-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The paper is focused on the importance of accurate determination of surface damage/ablation threshold of a dielectric material irradiated with femtosecond laser pulses. We show that different damage characterization techniques and data treatment procedures from a single experiment provide complementary physical results characterizing laser-matter interaction. We thus compare and discuss two regression techniques, well adapted to the measurement of laser ablation threshold, and a statistical approach giving the laser damage threshold and further information concerning the deterministic character of femtosecond damage. These two measurements are crucial for laser micromachining processes and high peak-power laser technology in general.

引用

页码：889 / 897

页数：9

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