Basal-plane stacking faults and polymorphism in AlN, GaN, and InN

被引:68
作者
Wright, AF
机构
[1] Sandia National Laboratories, Albuquerque
关键词
D O I
10.1063/1.366393
中图分类号
O59 [应用物理学];
学科分类号
摘要
Energies of basal-plane stacking faults in wurtzite AlN, GaN, and InN are determined using a one-dimensional Ising-type model incorporating effective layer-layer interactions obtained from density-functional-theory calculations. Stacking-fault energies are found to be largest for AIN and smallest for GaN consistent with density-functional results for the wurtzite/zinc-blende energy differences. Estimates are also given for stacking-fault energies in the zinc-blende structure. The values are negative, consistent with observations that nominal zinc-blende films typically contain large numbers of stacking faults. A related result is that hexagonal structures with stacking sequences repeating after four and six bilayers have lower energies than zinc-blende for all three compounds. (C) 1997 American Institute of Physics.
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页码:5259 / 5261
页数:3
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