CO dissociation on Rh deposited on reduced cerium oxide thin films

被引:64
作者
Mullins, DR [1 ]
Overbury, SH [1 ]
机构
[1] Oak Ridge Natl Lab, Oak Ridge, TN 37830 USA
关键词
carbon monoxide; ceria; rhodium; X-ray photoelectron spectroscopy;
D O I
10.1006/jcat.1999.2679
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The adsorption and reaction of CO on Rh-loaded ceria was studied by soft x-ray photoelectron spectroscopy. The system was studied as a function of the degree of oxidation of the ceria and different preparations of the Rh. Molecular CO and atomic C on Rh are readily distinguished in the C Is spectra. CO adsorbed directly on ceria, possibly as carbonate or carboxylate, is also observed in the C Is spectra. The degree of dissociation of CO an Rh deposited on ceria (Rh/CeOx) is directly dependent on the degree of oxidation of the ceria. Nearly total decomposition can occur if the ceria substrate is highly reduced. Molecular CO also persists to a higher temperature on Rh deposited on reduced ceria compared with Rh an oxidized ceria. The degree of dissociation does not depend on the amount of Rh deposited or on the annealing treatment after deposition.
引用
收藏
页码:340 / 345
页数:6
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