Active and spectator adsorbates during NO decomposition over Cu-ZSM-5: Transient IR, site-poisoning, and site-promotion studies

被引:36
作者
Konduru, MV [1 ]
Chuang, SSC [1 ]
机构
[1] Univ Akron, Dept Chem Engn, Akron, OH 44325 USA
关键词
site poisoning; site promotion; in situ IR; direct NO decomposition; Cu-ZSM-5; over-exchanged; under-exchanged; active adsorbates; spectator adsorbates; reaction mechanism; deactivation pathway; CO promotion;
D O I
10.1006/jcat.1999.2638
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
A site-poisoning and -promotion technique was employed to investigate the role of adsorbates and to formulate a reaction pathway for the NO decomposition reaction over Cu-ZSM-5. Transient infrared and mass spectrometer studies of pulse NO reaction on under- and over-exchanged Cu-ZSM-5 reveal Cu2+(NO), Cu+(NO), bridging Cu2+(NO3-), and NO+ as the major adsorbates and N-2, N2O, O-2, and NO2 as the products. SiH4 and H2O moderately inhibited Cu+(NO) and N-2 formation, but severely inhibited CU2+(NO3-) and O-2 formation. Addition of CO as a reducing agent led to the promotion of Cu2+ reduction to Cu+, depletion of Cu2+(NO3-), increase in NO conversion and O-2 formation as well as formation of CO2. These results revealed that N-2 and O-2 formation proceeds through separate rate-limiting steps; O-2 formation occurs via both autoreduction of CU2+ to Cu+ and decomposition of Cu2+(NO3-). The results from pulse reaction studies on deactivated Cu-ZSIW-5 reveal that O-2 formation is more sensitive to poisoning than NO dissociation and N-2 formation. Although silanation may improve the hydrothermal stability of the catalyst, silanation severely inhibited O-2 and Cu2+(NO3-) formation through inhibition of adsorbed O migration. Promotion of O-2 desorption by addition of a small amount of reducing agent such as CO in the presence of NO (NO/CO > 3.5) can greatly enhance NO decomposition activity. Further investigation is needed to study such an effect on the NO decomposition activity under the O-2 environment. (C) 1999 Academic Press.
引用
收藏
页码:436 / 452
页数:17
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