Kinetics of phase formation in binary thin films: The Ni/Al case

被引：26

作者：

Garcia, VH ^{[1
]}

Mors, PM

Scherer, C

机构：

[1] Univ Fed Santa Catarina, Dept Phys, BR-89223100 Joinville, SC, Brazil

[2] Univ Fed Rio Grande Sul, Inst Phys, BR-91501970 Porto Alegre, RS, Brazil

[3] Univ Stuttgart, Inst Comp Applicat 1, D-70569 Stuttgart, Germany

来源：

ACTA MATERIALIA | 2000年 / 48卷 / 05期

关键词：

diffusion (interface); phase transformations (phase diagrams); theory and modeling (kinetics; transport; diffusion); thin films;

D O I：

10.1016/S1359-6454(99)00379-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The growth and/or dissociation of the intermetallic phases which are produced by interdiffusion in metallic thin film multilayers is studied by an approach based on a concentration-dependent diffusivity. No assumption is made on the a priori presence of seed layers of the phases that are expected to grow. Ap plication to the Ni/Al system gives a good agreement with the experimental data reported in the literature. (C) 2000 Acta Metallurgica Inc. Published by Elsevier Science Ltd. All rights reserved.

引用

页码：1201 / 1206

页数：6

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