Fabrication and characterization of CuIn(SxSe1-x)(2) thin films deposited by rf sputtering

被引:43
作者
Yamamoto, Y
Yamaguchi, T
Demizu, Y
Tanaka, T
Yoshida, A
机构
[1] WAKAYAMA COLL TECHNOL, DEPT ELECT ENGN, GOBO, WAKAYAMA 644, JAPAN
[2] TOYOHASHI UNIV TECHNOL, DEPT ELECT & ELECT ENGN, TEMPA KU, TOYOHASHI, AICHI 441, JAPAN
关键词
CuIn(SxSe1-x)(2);
D O I
10.1016/0040-6090(96)08625-7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Thin films of CuIn(SxSe1-x)(2) were prepared by r.f. sputtering from powder targets which were previously mixed from powdered binary compounds. X-ray diffraction analyses showed the films had the single phase chalcopyrite structure, and the lattice parameters (a and c) varied linearly with the increase in sulphur content x from x=0 (CuInSe2) to x=1 (CuInS2). The orientation to the (112) plane of the CuIn(SxSe1-x)(2) thin films increases as the sulphur content x increases. From scanning electron microscope images, the grain sizes in the films were found to decrease with the decrease in sulphur content. Optical transmittance measurements showed that bowing behaviour is not observed in the films.
引用
收藏
页码:372 / 374
页数:3
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