Development of the ultra-high-sensitive Kr adsorption technique to evaluate the pore-size distribution of thin-film materials

被引:13
作者
Yanazawa, H [1 ]
Mastunaga, H
Itoh, H
Nakai, K
Suzuki, I
机构
[1] Assoc Super Adv Elect Technol, Totsuka Ku, Yokohama, Kanagawa 2440817, Japan
[2] BEL Japan Inc, Osaka 5320025, Japan
[3] Utsunomiya Univ, Fac Educ, Utsunomiya, Tochigi 3218505, Japan
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2002年 / 20卷 / 05期
关键词
D O I
10.1116/1.1500751
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
To meet the increased demand of porosity evaluation of low-k materials, the ultra-high-sensitive Kr gas adsorption technique was developed. A homemade differential-type adsorption apparatus enables us to detect Kr adsorption as small as 2 mug. This corresponds to the sensitivity improvement by four orders of magnitude compared to the conventional nitrogen adsorption method. Established analytical procedures for the pore-size distribution, Brunauer-Emmett-Teller. theory, Kelvin equation, and Dollimore-Heal method, are applied to Kr adsorption. The results were calibrated with one obtained from nitrogen adsorption using standard samples. Applicability of the Kr adsorption method to a low-k thin-film sample was demonstrated. (C) 2002 American Vacuum Society.
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页码:1833 / 1835
页数:3
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