On the Deposition Rates of Magnetron Sputtered Thin Films at Oblique Angles

被引：46

作者：

Alvarez, Rafael ^{[1
]}

Garcia-Martin, Jose M. ^{[2
]}

Lopez-Santos, Maria C. ^{[1
]}

Rico, Victor ^{[1
]}

Ferrer, Francisco J. ^{[3
]}

Cotrino, Jose ^{[1
,4
]}

Gonzalez-Elipe, Agustin R. ^{[1
]}

Palmero, Alberto ^{[1
]}

机构：

[1] Univ Seville, Inst Ciencia Mat Sevilla CSIC, Seville 41092, Spain

[2] CSIC, IMM Inst Microelect Madrid CNM, PTM, E-28760 Madrid, Spain

[3] Univ Seville, CSIC, Ctr Nacl Aceleradores, Junta Andalucia, E-41092 Seville, Spain

[4] Univ Seville, Dept Fis Atom Mol & Nucl, E-41071 Seville, Spain

来源：

PLASMA PROCESSES AND POLYMERS | 2014年 / 11卷 / 06期

关键词：

deposition rates; magnetron sputtering; modeling; oblique angle deposition; thin films; THROW DISTANCE; THERMALIZATION;

D O I：

10.1002/ppap.201300201

中图分类号：

O59 [应用物理学];

学科分类号：

070305 [高分子化学与物理];

摘要：

We describe here the deposition of thin films using magnetron sputtering at oblique angles. General relations between the deposition rates of the films and experimental parameters, such as gas pressure or substrate tilt angles, are deduced and experimentally tested. The model also permits the direct determination of the thermalization mean free path of the sputtered particles in the plasma gas, a key parameter defining the balance between ballistic and diffusive flows in the deposition reactor. The good agreement between experimental and calculated results supports the validity of our description, which becomes a useful tool to explain the main features of the magnetron sputtering deposition of thin films at oblique angles.

引用

页码：571 / 576

页数：6

共 33 条

[1]

Growth of SiO2 and TiO2 thin films deposited by reactive magnetron sputtering and PECVD by the incorporation of non-directional deposition fluxes [J].

Alvarez, R. ;

Romero-Gomez, P. ;

Gil-Rostra, J. ;

Cotrino, J. ;

Yubero, F. ;

Gonzalez-Elipe, A. R. ;

Palmero, A. .

PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2013, 210 (04) :796-801

[2]

Growth regimes of porous gold thin films deposited by magnetron sputtering at oblique incidence: from compact to columnar microstructures [J].

Alvarez, R. ;

Garcia-Martin, J. M. ;

Macias-Montero, M. ;

Gonzalez-Garcia, L. ;

Gonzalez, J. C. ;

Rico, V. ;

Perlich, J. ;

Cotrino, J. ;

Gonzalez-Elipe, A. R. ;

Palmero, A. .

NANOTECHNOLOGY, 2013, 24 (04)

[3]

On the microstructure of thin films grown by an isotropically directed deposition flux [J].

Alvarez, R. ;

Romero-Gomez, P. ;

Gil-Rostra, J. ;

Cotrino, J. ;

Yubero, F. ;

Palmero, A. ;

Gonzalez-Elipe, A. R. .

JOURNAL OF APPLIED PHYSICS, 2010, 108 (06)

[4]

Depla D, 2008, SPRINGER SER MATER S, V109, P1, DOI 10.1007/978-3-540-76664-3

[5]

Investigation of the throw distance of sputtered atoms under consideration of gas rarefaction [J].

Drüsedau, TE .

SURFACE & COATINGS TECHNOLOGY, 2003, 174 :470-474

[6]

Gas heating and throw distance for the sputter deposition of aluminum and tungsten [J].

Drüsedau, TP .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2002, 20 (02) :459-466

[7]

Drusedau TP, 1998, J VAC SCI TECHNOL A, V16, P2728, DOI 10.1116/1.581408

[8]

Reactive magnetron sputtering of transparent conductive oxide thin films: Role of energetic particle (ion) bombardment [J].

Ellmer, Klaus ;

Welzel, Thomas .

JOURNAL OF MATERIALS RESEARCH, 2012, 27 (05) :765-779

[9]

Franz G., 2009, LOW PRESSURE PLASMAS, P28

[10]

Low refractive index SiOF thin films prepared by reactive magnetron sputtering [J].

Garcia-Garcia, F. J. ;

Gil-Rostra, J. ;

Terriza, A. ;

Gonzalez, J. C. ;

Cotrino, J. ;

Frutos, F. ;

Ferrer, F. J. ;

Gonzalez-Elipe, A. R. ;

Yubero, F. .

THIN SOLID FILMS, 2013, 542 :332-337

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