On the modeling of TiO plume expansion under laser ablation

被引:3
作者
Colonna, G [1 ]
Casavola, A [1 ]
Capitelli, M [1 ]
机构
[1] Univ Bari, Ctr Studio Chim Plasmi, I-70126 Bari, Italy
来源
ALT'99 INTERNATIONAL CONFERENCE ON ADVANCED LASER TECHNOLOGIES | 2000年 / 4070卷
关键词
D O I
10.1117/12.378169
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
In this work a theoretical model to describe the expansion of the plume ablated from a monoxide titanium target is presented. The flow expansion has been studied by mean of the Euler equations. Consideration of equilibrium and frozen conditions along the plume expansion allows the prediction of film composition on the substrate.
引用
收藏
页码:293 / 299
页数:7
相关论文
共 12 条
[1]   Non-arrhenius NO formation rate in one-dimensional nozzle airflow [J].
Colonna, G ;
Tuttafesta, M ;
Capitelli, M ;
Giordano, D .
JOURNAL OF THERMOPHYSICS AND HEAT TRANSFER, 1999, 13 (03) :372-375
[2]  
COLONNA G, 1997, SUPPLEMENTO RENDIC 2, V57, P159
[3]  
Comte P, 1996, LES HOUCH S, V59, P165
[4]  
GIORDANO D., 1994, ESA STR-237
[5]  
GIORDANO D, 1994, STR236 ESA
[6]  
HERZBERG KG, 1950, MOL SPECTRA MOL STRU
[7]   GAS-DYNAMICS OF THE PULSED EMISSION OF A PERFECT GAS WITH APPLICATIONS TO LASER SPUTTERING AND TO NOZZLE EXPANSION [J].
KELLY, R .
PHYSICAL REVIEW A, 1992, 46 (02) :860-874
[8]   PULSED-LASER SPUTTERING OF ATOMS AND MOLECULES .1. BASIC SOLUTIONS FOR GAS-DYNAMIC EFFECTS [J].
KELLY, R ;
MIOTELLO, A .
APPLIED PHYSICS B-PHOTOPHYSICS AND LASER CHEMISTRY, 1993, 57 (02) :145-158
[9]  
LANDAU DL, 1986, STAT PHYSICS
[10]  
MOORE CE, 1949, ATOMIC ENERGY LEVELS