Tungsten pedestal structure for nanotriode devices

被引:5
作者
Blackburn, AM [1 ]
Hasko, DG
Ahmed, H
Williams, DA
机构
[1] Univ Cambridge, Cavendish Lab, Microelect Res Ctr, Cambridge CB3 0HE, England
[2] Hitachi Europe Ltd, Cavendish Lab, Hitachi Cambridge Lab, Cambridge CB3 0HE, England
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2004年 / 22卷 / 03期
关键词
D O I
10.1116/1.1722182
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The nanotriode is a vacuum nanoelectronic device with a turn-on voltage for a field emission of similar to8 V, in which electrons are emitted from a metal nanotip with a radius similar to1 nm in an integrated vacuum chamber, over a distance of similar to100 nm. However, surface breakdown Of the gate-cathode dielectric within the device chamber occurs similar to2 V outside of its operating range, limiting the reliable range of field-emission observation. To increase this surface breakdown voltage, while maintaining the operating voltage range, a pedestal structure has been developed that can be incorporated into the nanotriode. This structure has a thicker dielectric layer, while maintaining a gate-cathode separation similar to that used previously. Measurements on vacuum-encapsulated two-terminal devices show field emission in the same voltage range and with similar characteristics to those previously observed; in consequence of the pedestal, higher surface breakdown voltages are achieved and the significance of the leakage current is reduced. (C) 2004 American Vacuum Society.
引用
收藏
页码:1298 / 1302
页数:5
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