Ordered block-copolymer assembly using nanoimprint lithography

被引：122

作者：

Li, HW

Huck, WTS

机构：

[1] Univ Cambridge, Nanosci Ctr, Cambridge CB3 0FF, England

[2] Univ Cambridge, Dept Chem, Melville Lab Polymer Synth, Cambridge CB2 1EW, England

来源：

NANO LETTERS | 2004年 / 4卷 / 09期

关键词：

D O I：

10.1021/nl049209r

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Nanoimprint lithography and self-assembly of poly(styrene)-block-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymer are combined to induce order in the phase-separated domains. Tailored periodic arrays of poly(methyl methacrylate) (PMMA) cylinders normal or parallel to neutralized silicon surfaces can be formed inside the gap of imprint molds. This method opens up a new route to the controlled phase separation of block copolymers with precise placement of the phase-separated domains.

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页码：1633 / 1636

页数：4

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