An in situ XPS study of site competition between CO and NO on Rh(111) in equilibrium with the gas phase

被引：29

作者：

Requejo, FG

Hebenstreit, ELD

Ogletree, DF

Salmeron, M ^{[1
]}

机构：

[1] Natl Univ La Plata, Fac Ciencias Exactas, Dept Fis, RA-1900 La Plata, Argentina

[2] IFLP, CONICET, RA-1900 La Plata, Argentina

[3] Univ Calif Berkeley, Lawrence Berkeley Lab, Div Mat Sci, Berkeley, CA 94720 USA

来源：

JOURNAL OF CATALYSIS | 2004年 / 226卷 / 01期

关键词：

CO oxidation; NO reduction; in situ photoelectron spectroscopy;

D O I：

10.1016/j.jcat.2004.05.010

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The nature of the adsorption sites of CO and NO as they compete to adsorb on a Rh(111) surface has been determined using by X-ray photoelectron spectroscopy in situ, under gas mixtures of the reactants in the Pascal pressure range. It was found that near room temperature NO readily displaced CO from threefold hollow sites when the NO partial pressure was below 30%. CO is displaced from top sites only at higher NO pressures and after heating. The kinetics of CO:NO exchange at top sites is very slow at room temperature (hours), and requires heating for complete exchange. (C) 2004 Elsevier Inc. All rights reserved.

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页码：83 / 87

页数：5

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