Growth, structure, and morphology of TiO2 films deposited by molecular beam epitaxy in pure ozone ambients

被引：23

作者：

Fisher, Patrick

Maksimov, Oleg

Du, Hui

Heydemann, Volker D.

Skowronski, Marek

Salvador, Paul A. ^{[1
]}

机构：

[1] Carnegie Mellon Univ, Dept Mat Sci & Engn, Pittsburgh, PA 15213 USA

[2] Penn State Univ, Electroopt Ctr, Freeport, PA 16229 USA

来源：

MICROELECTRONICS JOURNAL | 2006年 / 37卷 / 12期

基金：

美国国家科学基金会;

关键词：

titanium dioxide; MBE; thin film epitaxy;

D O I：

10.1016/j.mejo.2006.05.010

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

TiO2 films were grown using a reactive molecular beam epitaxy system equipped with high-temperature effusion cells as sources for Ti and an ozone distillation system as a source for O. The growth mode, characterized in-situ by reflection high-energy electron diffraction (RHEED), as well as the phase assemblage, structural quality, and surface morphology, characterized ex-situ by X-ray diffraction and atomic force microscopy (AFM), depended on the choice of substrate, growth temperature, and ozone flux. Films deposited on (100) surfaces of SrTiO3, (La0.27Sr0.73)(Al0.65Ta0.35)O-3, and LaAlO3 grew as (001)-oriented anatase. Both RHEED and AFM indicated that smoother surfaces were observed for those grown at higher ozone fluxes. Moreover, while RHEED patterns indicated that anatase films grown at higher temperatures were smoother, AFM images showed presence of large inclusions in these films. (c) 2006 Elsevier Ltd. All rights reserved.

引用

页码：1493 / 1497

页数：5

共 23 条

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