Characterization of magnetron-sputtered chromium and iron nitride films

被引：20

作者：

Kacsich, T

Niederdrenk, M

Schaaf, P

Lieb, KP

Geyer, U

Schulte, O

机构：

[1] UNIV GOTTINGEN,INST PHYS 1,D-37073 GOTTINGEN,GERMANY

[2] UNIV GOTTINGEN,SFB 345,D-37073 GOTTINGEN,GERMANY

来源：

SURFACE & COATINGS TECHNOLOGY | 1997年 / 93卷 / 01期

关键词：

chromium nitride film; iron; magnetron;

D O I：

10.1016/S0257-8972(97)00035-2

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Chromium and iron nitride layers (with thicknesses of 100-1000 nm) were deposited onto silicon substrates via reactive rf magnetron sputtering. Stoichiometry, phase formation and surface morphology were analyzed by a combination of different methods: Rutherford Backscattering Spectrometry, Resonant Nuclear Reaction Analysis, Conversion Electron Mossbauer Spectroscopy, Scanning Tunneling Microscopy and X-Ray Diffraction. (C) 1997 Elsevier Science S.A.

引用

页码：32 / 36

页数：5

共 18 条

[1]

[Anonymous], XRAY DIFFRACTION PRO

[2]

BOROWSKI M, UNPUB

[3] COMPOSITIONAL, MICROSTRUCTURAL AND MORPHOLOGICAL EFFECTS ON THE MECHANICAL AND TRIBOLOGICAL PROPERTIES OF CHROMIUM NITROGEN FILMS [J].