Light-induced diffusion and desorption of alkali metals in a siloxane film: Theory and experiment

被引:74
作者
Atutov, SN
Biancalana, V
Bicchi, P
Marinelli, C
Mariotti, E
Meucci, M
Nagel, A
Nasyrov, KA
Rachini, S
Moi, L
机构
[1] INFM, I-53100 Siena, Italy
[2] Univ Siena, Dipartimento Fis, I-53100 Siena, Italy
[3] Russian Acad Sci, Inst Automat & Electrometry, Novosibirsk 90, Russia
[4] Inst Angew Phys, Bonn, Germany
来源
PHYSICAL REVIEW A | 1999年 / 60卷 / 06期
关键词
D O I
10.1103/PhysRevA.60.4693
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The light-induced desorption and diffusion of alkali-metal atoms in organic films are interesting fields of investigation. An impressive demonstration is given by the recently observed light-induced atomic desorption (LIAD) effect, where a huge alkali-metal atom desorption from siloxane films, previously exposed to atomic vapors, is induced by weak and nonresonant light. In this paper, experimental data and a one-dimensional theoretical model of the effect are presented. The model gives a good description of the vapor density dynamics by taking into account both the atomic diffusion inside the coating and the surface desorption. General equations are reported and discussed within the limits of experimental interest. The potential barrier at the vapor-surface interface and the activation energy for Rb in (poly)dimethylsiloxane have been determined. [S1050-2947(99)01512-7].
引用
收藏
页码:4693 / 4700
页数:8
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