Growth mechanism and properties of the large area well-aligned carbon nano-structures deposited by microwave plasma electron cyclotron resonance chemical vapor deposition

Large area (4-inch diameter) well-aligned carbon nano-structures on Si substrate were successfully synthesized by using a catalyst-assisted microwave plasma electron cyclotron resonance chemical vapor deposition (ECR-CVD) system with CH4 as source gas. The catalysts include Fe, Co and Ni. The catalysts and the deposited nano-structures were characterized by scanning electron microscopy (SEM) transmission electron microscopy (TEM), Raman and field emission I-V measurements. Effects of process parameters on morphologies, structures and properties of the nano-structures were examined. The results show that the deposited nano-structures can include normal nano-tubes, split catalyst nano-tubes, seaweed-like nano-sheets and carbon film, depending mainly on substrate temperature and bias, catalyst materials and their application methods. Deposition mechanisms for different nano-structures, especially, the unique split catalyst nano-tubes and seaweed-like nano-sheets, were proposed. The differences in oxidation resistance and field emission proper-ties between different nano-structures will be compared and discussed. (C) 2002 Elsevier Science B.V. All rights reserved.