Characterization of r.f. sputtered thin Mo, W and Si films as precursors to multilayer X-ray mirrors

被引:6
作者
Bhattacharyya, D.
Joseph, D. [1 ]
Poswal, A. K.
机构
[1] Bhabha Atom Res Ctr, Div Nucl Phys, Van de Graff Lab, Bombay 400085, Maharashtra, India
[2] Bhabha Atom Res Ctr, Div Spect, Bombay 400085, Maharashtra, India
关键词
X-ray mirror; X-ray reflectivity; r.f; sputtering;
D O I
10.1016/j.nimb.2006.03.195
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Single layers of Mo, W and Si thin films have been deposited by r.f. sputtering on float glass and c-Si substrates kept at room temperature. The films have been characterised by grazing incidence X-ray reflectometry (GIXR), X-ray transmission (XRT), Rutherford backscattering spectrometry (RBS), atomic force microscopy (AFM) and phase modulated spectroscopic ellipsometry (SE) studies. The thickness values obtained from the GIXR measurements have been used to calibrate the in situ thickness monitors. The surface roughness of the thin layers have also been determined from the GIXR measurements. The atomic mass density in the films have been obtained from the RBS measurements while X-ray absorption has been estimated from the XRT measurements. The surface morphology of the films has been investigated by the AFM micrographs. The Si thin films have also been characterized by the SE technique. The characterization of the samples by these complementary techniques have been very useful in optimizing the process parameters to obtain good quality layers as precursors to the fabrication of the multilayer X-ray mirrors based on MON and W/Si structures. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:264 / 272
页数:9
相关论文
共 42 条
[1]  
Bhattacharyya D., 1999, Journal of Optics, V28, P1
[2]   Spectroscopic ellipsometry of TiO2 layers prepared by ion-assisted electron-beam evaporation [J].
Bhattacharyya, D ;
Sahoo, NK ;
Thakur, S ;
Das, NC .
THIN SOLID FILMS, 2000, 360 (1-2) :96-102
[3]   Characterization of a multilayer highly reflecting mirror by spectroscopic phase-modulated ellipsometry [J].
Bhattacharyya, D ;
Sahoo, NK ;
Thakur, S ;
Das, NC .
APPLIED OPTICS, 2001, 40 (10) :1707-1714
[4]  
BHATTACHARYYA D, 2000, E024 BHABH AT RES CT
[5]   Transport properties of sputtered W/C multilayers in high fields [J].
Broto, JM ;
Ousset, JC ;
Rakoto, H ;
Vidal, B ;
Jiang, Z ;
Sdaq, A ;
Khmou, A .
JOURNAL OF APPLIED PHYSICS, 1997, 81 (04) :1820-1824
[7]  
Chu W. K., 1978, Backscattering Spectrometry
[8]  
COLA RR, 1992, APPL PHYS LETT, V60, P3120
[9]   An ellipsometric study of W thin films deposited on Si [J].
Deineka, AG ;
Tarasenko, AA ;
Jastrabík, L ;
Chvostova, D ;
Bousek, J .
THIN SOLID FILMS, 1999, 339 (1-2) :216-219
[10]   A novel type of texture in molybdenum thin films [J].
Drusedau, TP ;
Klabunde, F ;
Lohmann, M ;
Blasing, J .
PHYSICA STATUS SOLIDI B-BASIC RESEARCH, 1996, 196 (02) :K21-K23