Advanced sacrificial poly-Si technology for fluidic systems

被引：15

作者：

Berenschot, JW ^{[1
]}

Tas, NR ^{[1
]}

Lammerink, TSJ ^{[1
]}

Elwenspoek, M ^{[1
]}

van den Berg, A ^{[1
]}

机构：

[1] Univ Twente, MES Res Inst, NL-7500 AE Enschede, Netherlands

来源：

JOURNAL OF MICROMECHANICS AND MICROENGINEERING | 2002年 / 12卷 / 05期

关键词：

Anisotropy - Etching - Potassium compounds - Scanning electron microscopy - Substrates;

D O I：

10.1088/0960-1317/12/5/317

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Sacrificial poly-Si etching can be used to create thin cavities and channels. By combining it with anisotropic KOH etching of a mono-Si substrate, important components for fluidic systems., such as V-grooved channels, thin sandwiched channels, channel crossings and membrane filters and injectors, have been fabricated in a single etch step.

引用

页码：621 / 624

页数：4

共 7 条

[1]

LAMMERINK TSJ, UNPUB

[2]

MIYAKE R, 1993, P IEEE MEMS WORKSH F

[3] Nanochannel fabrication for chemical sensors [J].

Stern, MB ;

Geis, MW ;

Curtin, JE .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1997, 15 (06) :2887-2891

[4]

SUGIYAMA S, 1991, P 6 INT C SOL STAT S, P188

[5]

SUGIYAMA S, 1986, P INT EL DEV M 1986, P184

[6] NEUROPSYCHOLOGICAL PROCESSES ASSOCIATED WITH NORMAL AGING [J].

VANGORP, WG ;

SATZ, P ;

MITRUSHINA, M .

DEVELOPMENTAL NEUROPSYCHOLOGY, 1990, 6 (04) :279-290

[7]

VANRIJN CJM, 1995, MICRO ELECTRO MECHANICAL SYSTEMS - IEEE PROCEEDINGS, 1995, P83, DOI 10.1109/MEMSYS.1995.472549

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