Ge doping effect on properties of AgInSe2 thin films

被引:8
作者
Ema, Y [1 ]
Kato, H [1 ]
Takahashi, T [1 ]
机构
[1] Shizuoka Univ, Fac Engn, Hamamatsu, Shizuoka 4328561, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2002年 / 41卷 / 3A期
关键词
chalcopyrite; AgInSe2; thin film; Ge doping; 112] orientation; SIMS; SEM; Raman scattering; n-type; conductivity;
D O I
10.1143/JJAP.41.1527
中图分类号
O59 [应用物理学];
学科分类号
摘要
The effect of Ge doping on the properties of AgInSe2 thin films has been investigated by the co-evaporation of AgInSe2 alloy chunks, Se and Ge on Corning 7059 glass substrates. Samples were nearly stoichiometric and contained very small amounts of Ge. They showed a highly [112]-oriented chalcopyrite structure, good optical transmittance spectra in the IR region (lambda = 1-2.6 mum) and an increase of n-type conductivity compared with the nondoped sample. Raman scattering suggested that the doped Ge atoms replaced some of the In atoms in the chalcopyrite structure. The Ge-doped sample grew uniformly from the beginning of film deposition.
引用
收藏
页码:1527 / 1531
页数:5
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