Partial desorption of alkanethiol monolayer from gold substrate modified with Ag and Cu

被引：14

作者：

Kuwabata, S ^{[1
]}

Kanemoto, H ^{[1
]}

Oyamatsu, D ^{[1
]}

Yoneyama, H ^{[1
]}

机构：

[1] Osaka Univ, Grad Sch Engn, Dept Chem Mat, Suita, Osaka 5650871, Japan

来源：

ELECTROCHEMISTRY | 1999年 / 67卷 / 12期

关键词：

self-assembled monolayer; alkanethiol; underpotential deposition;

D O I：

10.5796/electrochemistry.67.1254

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

In our previous studies, it was found that underpotential deposition (UPD) of Ag or Gu on an Au electrode coated with a self-assembled monolayer (SAM) of alkanethiol enhanced stability of the monolayer against its reductive desorption in an alkaline solution. Degree of the stabilization effect was higher for the Cu UPD than the Ag UPD. By utilizing such the behavior, a new method to induce partial desorption of the SAM has been developed in this study. This method enables easy changes in the ratio of thiol-free areas, and numerous pores can be generated in the monolayer when the ratio of the thiol-free areas was small.

引用

页码：1254 / 1257

页数：4

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