20 μm cutoff heterojunction interfacial work function internal photoemission detectors

被引:15
作者
Matsik, SG [1 ]
Rinzan, MBM
Esaev, DG
Perera, AGU
Liu, HC
Buchanan, M
机构
[1] Georgia State Univ, Dept Phys & Astron, Atlanta, GA 30303 USA
[2] CNR, Inst Microstruct Sci, Ottawa, ON K1A 0R6, Canada
关键词
D O I
10.1063/1.1634386
中图分类号
O59 [应用物理学];
学科分类号
摘要
Results are reported on Heterojunction Interfacial Workfunction Internal Photoemission (HEIWIP) detectors designed for operation up to 20 mum. The peak response of 100 mA/W at 12.5 mum with a D* of 2x10(11) Jones was observed with a cutoff wavelength of similar to20 mum. The BLIP temperature for the devices was 40 K at 1.5 V bias. While the peak response remained almost constant (similar to95 mA/W) up to 40 K, the D* reduced to 5x10(9) Jones due to the increased dark current. The response increased with doping while the dark current did not change significantly. Hence, higher responsivity and D* can be expected for designs with higher doping. Designs utilizing increased reflection from the bottom contact are suggested to improve the resonant cavity enhancement for optimizing the detectors, which should lead to higher D* and BLIP temperature. (C) 2004 American Institute of Physics.
引用
收藏
页码:3435 / 3437
页数:3
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