Composite metal/C:H films prepared by unbalanced magnetron sputtering: Ni/C:H

被引:12
作者
Biederman, H
Hlidek, P
Pesicka, J
Slavinska, D
Stundzia, V
Zemek, J
Kingdon, RJ
Howson, RP
机构
[1] ACAD SCI CZECH REPUBL,INST PHYS,PRAGUE,CZECH REPUBLIC
[2] LOUGHBOROUGH UNIV TECHNOL,DEPT PHYS,LOUGHBOROUGH LE11 3TU,LEICS,ENGLAND
关键词
D O I
10.1016/S0042-207X(96)00207-2
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Composite Ni/C:H films were prepared in two ways: using a working gas mixture butane/Ar in a closed field unbalanced twin magnetron system powered by 40 kHz voltage and using n-hexane/Ar mixture also in an unbalanced planar magnetron system with RF powered substrate support that could provide additional de negative bias. General electrical and optical properties, morphology observed by TEM and composition by XPS of Ni/C:H films are described. Because the films showed ageing in the morphology and in de electrical resistance a more detailed study of this phenomenon in case of Ni/C:H films deposited by de unbalanced magnetron using n-hexane/Ar mixture was performed. These films were compared to those prepared when additional de negative bias up to -300 V was imposed during deposition. Qualitative explanation of the ageing is proposed. Copyright (C) 1996 Elsevier Science Ltd
引用
收藏
页码:1453 / 1463
页数:11
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