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Manufacture of specific structure of aluminum-doped zinc oxide films by patterning the substrate surface

被引：94
作者：
Jiang, X
Jia, CL
Szyszka, B
机构：
[1] Fraunhofer Inst Schicht & Oberflachentech, D-38108 Braunschweig, Germany
[2] Forschungszentrum Julich, Inst Festkorperforsch, D-52425 Julich, Germany
来源：
APPLIED PHYSICS LETTERS | 2002年 / 80卷 / 17期
关键词：
D O I：
10.1063/1.1473683
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
(0001)-oriented aluminum-doped zinc oxide films were prepared using a magnetron sputtering technique. High-resolution transmission-electron-microscopic images show that the oriented grains nucleate directly on the substrate surface and grow with equal lateral dimensions through the film thickness. A surface-energy-driven self-texture mechanism was proposed on the basis of process modes. A method for manufacturing specific film structure by patterning the substrate surface is tested and discussed. (C) 2002 American Institute of Physics.
引用
收藏
页码：3090 / 3092
页数：3
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