Asymmetric phase masks for extended depth of field

被引：87

作者：

Castro, A

Ojeda-Castañeda, J

机构：

[1] Inst Nacl Astrofis Opt & Electr, Puebla 72000, Mexico

[2] Univ Las Amer, Escuela Ciencias, Cholula 72820, Puebla, Mexico

来源：

APPLIED OPTICS | 2004年 / 43卷 / 17期

关键词：

D O I：

10.1364/AO.43.003474

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We present a family of asymmetric phase masks that extends the depth of field of an optical system. To verify our proposal, we compute several modulation transfer functions with focus errors, and we report numerical simulations of the images that can be achieved by use of our proposed procedure. (C) 2004 Optical Society of America.

引用

页码：3474 / 3479

页数：6

共 22 条

[1]

Alvarez L.W., 1964, U. S. patent, Patent No. [3305294, 3,305,294]

[2] THE AMBIGUITY FUNCTION AS A POLAR DISPLAY OF THE OTF [J].

BRENNER, KH ;

LOHMANN, AW ;

OJEDACASTANEDA, J .

OPTICS COMMUNICATIONS, 1983, 44 (05) :323-326

[3]

Castleman K.R., 1996, DIGITAL IMAGE PROCES, P387

[4] EXTENDED DEPTH OF FIELD THROUGH WAVE-FRONT CODING [J].

DOWSKI, ER ;

CATHEY, WT .

APPLIED OPTICS, 1995, 34 (11) :1859-1866

[5]

Dowski ER, 1999, P SOC PHOTO-OPT INS, V3779, P137, DOI 10.1117/12.368203

[6]

GONZALEZ RC, 1992, DIGITAL IMAGE PROCES, P268

[7]

Goodman J. W., 1996, INTRO FOURIER OPTICS, P148

[8]

Hausler G., 1972, Optics Communications, V6, P38, DOI 10.1016/0030-4018(72)90243-X

[9]

Lohmann A.W., 1964, Italian Patent, Patent No. [No. 727,848, 727848]

[10] A NEW CLASS OF VARIFOCAL LENSES [J].

LOHMANN, AW .

APPLIED OPTICS, 1970, 9 (07) :1669-&

← 1 2 3 →