Aligned carbon nanotube films for cold cathode applications

被引：58

作者：

Obraztsov, AN ^{[1
]}

Pavlovsky, I

Volkov, AP

Obraztsova, ED

Chuvilin, AL

Kuznetsov, VL

机构：

[1] Moscow MV Lomonosov State Univ, Dept Phys, Moscow 119899, Russia

[2] Russian Acad Sci, Inst Gen Phys, Moscow 117942, Russia

[3] Russian Acad Sci, Boreskov Inst Catalysis, Novosibirsk 630090, Russia

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2000年 / 18卷 / 02期

关键词：

D O I：

10.1116/1.591328

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Thin film material of oriented multiwall carbon nanotubes was obtained by noncatalytical chemical vapor deposition in a glow-discharge plasma. The film phase composition, surface morphology, and structural features were studied by Raman and electron microscopy techniques. Low-voltage electron field emission of thin film nanotube material was obtained and examined in diode configuration. The I-V curves in Fowler-Nordheim coordinates were linear and the corresponding threshold average field was about 1.5 V/mu m. The emission current density was up to 50 mA/cm(2) at the field of 5 V/mu m. The emission site density reached 10(7) cm(-2) at the same value of electric field. (C) 2000 American Vacuum Society. [S0734-211X(00)09602-5].

引用

页码：1059 / 1063

页数：5

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