Fabricating nanometer-scale Co dot and line arrays on Cu(100) surfaces

被引：43

作者：

Silva, SL ^{[1
]}

Jenkins, CR ^{[1
]}

York, SM ^{[1
]}

Leibsle, FM ^{[1
]}

机构：

[1] Univ Missouri, Dept Phys, Kansas City, MO 64110 USA

来源：

APPLIED PHYSICS LETTERS | 2000年 / 76卷 / 09期

关键词：

D O I：

10.1063/1.125959

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We have templated Cu(100) surfaces with self-assembled arrays of atomic nitrogen islands and then used these islands as masks for Co growth. This method of nanolithography enables the creation of Co dot arrays with dot densities 4 x 10(12) cm(-2) (27 teradots/in.(2)). Adjusting the nitrogen coverage also enabled the creation of arrays of Co lines spaced 10 nm (0.01 mu m) apart. (C) 2000 American Institute of Physics. [S0003-6951(00)04309-6].

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页码：1128 / 1130

页数：3

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