Measuring thin film and multilayer elastic constants by coupling in situ tensile testing with x-ray diffraction

被引:68
作者
Badawi, KF [1 ]
Villain, P [1 ]
Goudeau, P [1 ]
Renault, PO [1 ]
机构
[1] Univ Poitiers, Met Phys Lab, SP2MI, CNRS,UMR 6630, F-86962 Futuroscope, France
关键词
D O I
10.1063/1.1488701
中图分类号
O59 [应用物理学];
学科分类号
摘要
A direct determination of the Young's modulus and the Poisson's ratio in a 140 nm polycrystalline tungsten thin film deposited by ion-beam sputtering on a polyimide substrate has been performed by coupling x-ray diffraction measurements with in situ tensile testing. The method described in this article to extract the Young's modulus of thin films from the evolution of the sin(2) psi curves as a function of applied load only requires to know the substrate Young's modulus. The determination of the thin film Poisson's ratio can be realized without knowing any of the substrate elastic constants. In the case of the tungsten thin film, the obtained Young's modulus was close to the bulk material one whereas the Poisson's ratio was significantly larger than the bulk one. (C) 2002 American Institute of Physics.
引用
收藏
页码:4705 / 4707
页数:3
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