Mechanism of columnar microstructure growth in titanium oxide thin films deposited by ion-beam assisted deposition

被引：36

作者：

Tang, Q

Kikuchi, K

Ogura, S

Macleod, A

机构：

[1] Sankyo Co Ltd, Shinagawa Ku, Tokyo 1408540, Japan

[2] Kobe Design Univ, Nishi Ku, Kobe, Hyogo 6512196, Japan

[3] Thin Film Ctr Inc, Tucson, AZ 85715 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1999年 / 17卷 / 06期

关键词：

D O I：

10.1116/1.582069

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The microstructure of titanium oxide thin films deposited by ion-assisted deposition was studied as a function of various process parameters such as the ratio of oxygen to argon in the ion beam, the ion/evaporant arrival ratio, and the substrate temperature. By changing the ratio of oxygen and argon ions, amorphous-like and different types of columnar microstructure could be induced in the films. The columnar microstructure was investigated by means of transmission and scanning electron microscopes. Crystal structures were investigated by x-ray diffraction and transmission electron microscopy. Growth models of columnar microstructure are proposed and the mechanism of columnar microstructure growth and the resulting optical properties are also discussed. (C) 1999 American Vacuum Society. [S0734-2101(99)03306-0].

引用

页码：3379 / 3384

页数：6

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