Photolabile dendrimers using ο-nitrobenzyl ether linkages

被引：52

作者：

Smet, M ^{[1
]}

Liao, LX ^{[1
]}

Dehaen, W ^{[1
]}

McGrath, DV ^{[1
]}

机构：

[1] Univ Arizona, Dept Chem, Tucson, AZ 85718 USA

来源：

ORGANIC LETTERS | 2000年 / 2卷 / 04期

关键词：

D O I：

10.1021/ol991373b

中图分类号：

O62 [有机化学];

学科分类号：

070303 ; 081704 ;

摘要：

[GRAPHICS] Benzyl aryl ether dendrimers containing photosensitive, veratryl-based o-nitrobenzyl AB linkages (bold bonds) were prepared to the third generation and shown to undergo site specific degradation when irradiated with ultraviolet light.

引用

页码：511 / 513

页数：3

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