Thin-film ruthenium dioxide coatings via ozone-mediated chemical vapor deposition

被引：8

作者：

Hashaikeh, R.

Butler, I. S.

Kozinski, J. A.

机构：

[1] McGill Univ, Energy & Environm Res Lab, Montreal, PQ H3A 2B2, Canada

[2] McGill Univ, Dept Chem, Montreal, PQ H3A 2B2, Canada

来源：

THIN SOLID FILMS | 2006年 / 515卷 / 04期

关键词：

chemical vapor deposition (CVD); RuO2; catalyst;

D O I：

10.1016/j.tsf.2006.07.038

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Thin films of RuO2 are attracting considerable interest lately, because of their various applications as advanced materials in the chemical and electronics industries. In this work, a coating technique has been developed that results in the formation of homogenous RuO2 coatings on stainless steel substrates. Metallic Ru is first vaporized using ozone (O-3) to form a gaseous mixture of RuO4, air and ozone. Then, the RuO4 is reduced and deposited as a thin RuO2 film on a hot (400 degrees C) stainless steel substrate. The coating produced has a needle-like structure, which leads to a significant increase in the surface area of the RuO2 coating. The stainless steel substrate tends to oxidize under the experimental conditions employed with the formation of a CrOx surface layer. As a result of the presence of this CrOx layer, the RuO2 films have good adhesion to the substrate. (c) 2006 Elsevier B.V. All rights reserved.

引用

页码：1918 / 1921

页数：4

共 10 条

[1] Microstructural characterization and electrochemical properties of RuO2 thin film electrodes prepared by reactive radio-frequency magnetron sputtering [J].