About traceability, reproducibility and comparability of grid calibrations

被引:5
作者
Bosse, H [1 ]
Haessler-Grohne, W [1 ]
Brendel, B [1 ]
机构
[1] PTB, Sect 5 11, D-38116 Braunschweig, Germany
来源
19TH ANNUAL SYMPOSIUM ON PHOTOMASK TECHNOLOGY, PTS 1 AND 2 | 1999年 / 3873卷
关键词
grid calibration; traceability; nominal accuracy; grid matching; registration;
D O I
10.1117/12.373342
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The national metrology institute of Germany, PTB, offers traceable, two-dimensional pattern placement calibrations of microstructures on masks. Whereas the measurement uncertainty for the calibrated pattern positions in terms of traceable coordinate values is only comparable to the position tolerances actually required for mask patterning, i.e about 35 ma, the deviations from the design grid can be determined with smaller uncertainties. In calibration certificates offered by PTB, these differences are taken into account and the uncertainties for the length of the grid and the uncertainties for the position deviations from the design grid are quoted separately as 30 nn and 10 nm respectively. Developments to further reduce the uncertainties are under way. An analysis of photomask recalibration results shows the long-term reproducibility of PTB length calibrations to be better than 15 nm or 1*10(-7), including substrate stability effects. Details of the recalibration results will be given. Leica Microsystems Lithography runs a laboratory for two-dimensional pattern placement calibrations, formally accredited by PTB within DKD, the German calibration service. Results of recent comparison measurements between the DKD laboratory and PTS on masks of different size will be given and discussed as an example of the process of dissemination of the length unit to industry.
引用
收藏
页码:477 / 483
页数:7
相关论文
共 12 条
  • [1] AN UPDATED EDLEN EQUATION FOR THE REFRACTIVE-INDEX OF AIR
    BIRCH, KP
    DOWNS, MJ
    [J]. METROLOGIA, 1993, 30 (03) : 155 - 162
  • [2] BIRCH KP, 1992, 14103 EUR EN COMM BU
  • [3] DUFF J, 1998, C P MASK TECHN INT C, P109
  • [4] FLUGGE J, 1999, C P EUSPEN BREM, P227
  • [5] HANTKE D, 1995, DEV 2 DIMENSIONAL HI
  • [6] HASSLERGROHNE W, 1991, SPIE P, V1604, P212
  • [7] HASSLERGROHNE W, 1999, C P EUSPEN BREM, P235
  • [8] *LEIC MICR WETZL, LMS IPRO PROD SPEC
  • [9] *SIA, 1997, NAT TECHN ROADM SEM, P97
  • [10] TAKAC MT, 1998, SPIE P, V3546, P498