Orthogonal Processing: A Novel Photolithographic Patterning Method for Organic Electronics

被引：27

作者：

Lee, Jin-Kyun ^{[1
]}

Taylor, Priscilla G. ^{[1
]}

Zakhidov, Alexander A. ^{[1
]}

Fong, Hon Hang ^{[1
]}

Hwang, Ha Soo ^{[1
]}

Chatzichristidi, Margarita ^{[1
]}

Malliaras, George G. ^{[1
]}

Ober, Christopher K. ^{[1
]}

机构：

[1] Cornell Univ, Dept Mat Sci & Engn, Ithaca, NY 14853 USA

来源：

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2009年 / 22卷 / 05期

基金：

美国国家科学基金会;

关键词：

photolithography; organic electronics; lift-off patterning; supercritical carbon dioxide; hydrofluoroethers; SUPERCRITICAL CARBON-DIOXIDE; LITHOGRAPHY; DEVICES;

D O I：

10.2494/photopolymer.22.565

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

Organic electronics is an extensively studied subject opening new horizons in electronics technology. It has attracted great attention as a technology to enable flexible electronic devices through solution processing of organic and polymeric materials. However, patterning of organic materials to construct device components still remains one of the major hurdles to be overcome due to problems with chemical processing. Fundamentally this challenge originates from the limited number of options regarding orthogonal solvents. Recently, we have identified supercritical carbon dioxide (scCO(2)) and segregated hydrofluoroethers (HFEs) as universal, non-damaging solvents for most non-fluorinated polymeric materials. These unconventional solvents expand processing options from the two-dimensional plane to three-dimensional space by drawing another orthogonal axis. Taking advantage of those noble solvents and fluorinated photoresists, we were able to make patterns of functional organic materials photolithographically. Furthermore, our orthogonal processing method has been applied to the fabrication of a patterned polymer light-emitting device in scCO(2) and an organic thin-film transisotor in HFEs.

引用

页码：565 / 569

页数：5

共 21 条

[1]

Cedeño CC, 2002, MICROELECTRON ENG, V61-2, P25, DOI 10.1016/S0167-9317(02)00505-1

[2] Sub-50 nm feature sizes using positive tone molecular glass resists for EUV lithography [J].

Chang, SW ;

Ayothi, R ;

Bratton, D ;

Yang, D ;

Felix, N ;

Cao, HB ;

Deng, H ;

Ober, CK .

JOURNAL OF MATERIALS CHEMISTRY, 2006, 16 (15) :1470-1474

[3] Imprint lithography with 25-nanometer resolution [J].

Chou, SY ;

Krauss, PR ;

Renstrom, PJ .

SCIENCE, 1996, 272 (5258) :85-87

[4] Photolithographic patterning of organic electronic materials [J].

DeFranco, JA ;

Schmidt, BS ;

Lipson, M ;

Malliaras, GG .

ORGANIC ELECTRONICS, 2006, 7 (01) :22-28

[5]

Flowers D, 2002, MATER RES SOC SYMP P, V705, P81

[6] Aqueous-based photoresist drying using supercritical carbon dioxide to prevent pattern collapse [J].

Goldfarb, DL ;

de Pablo, JJ ;

Nealey, PF ;

Simons, JP ;

Moreau, WM ;

Angelopoulos, M .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2000, 18 (06) :3313-3317

[7] Patterning of organic devices by interlayer lithography [J].

Huang, J. ;

Xia, R. ;

Kim, Y. ;

Wang, X. ;

Dane, J. ;

Hofmann, O. ;

Mosley, A. ;

de Mello, A. J. ;

de Mello, J. C. ;

Bradley, D. D. C. .

JOURNAL OF MATERIALS CHEMISTRY, 2007, 17 (11) :1043-1049

[8] Dry photolithographic patterning process for organic electronic devices using supercritical carbon dioxide as a solvent [J].

Hwang, Ha Soo ;

Zakhidov, Alexander A. ;

Lee, Jin-Kyun ;

Andre, Xavier ;

DeFranco, John A. ;

Fong, Hon Hang ;

Holmes, Andrew B. ;

Malliaras, George G. ;

Ober, Christopher K. .

JOURNAL OF MATERIALS CHEMISTRY, 2008, 18 (26) :3087-3090

[9] Scientific importance, properties and growing applications of poly( 3,4-ethylenedioxythiophene) [J].

Kirchmeyer, S ;

Reuter, K .

JOURNAL OF MATERIALS CHEMISTRY, 2005, 15 (21) :2077-2088

[10] Acid-sensitive semiperfluoroalkyl resorcinarene: An imaging material for organic electronics [J].

Lee, Jin-Kyun ;

Chatzichristidi, Margarita ;

Zakhidov, Alexander A. ;

Taylor, Priscilla G. ;

DeFranco, John A. ;

Hwang, Ha Soo ;

Fong, Hon Hang ;

Holmes, Andrew B. ;

Malliaras, George G. ;

Ober, Christopher K. .

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2008, 130 (35) :11564-+

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