Dislocation dynamics in sub-micron confinement: recent progress in Cu thin film plasticity

被引:25
作者
Dehm, G
Balk, TJ
von Blanckenhagen, B
Gumbsch, P
Arzt, E
机构
[1] Max Planck Inst Met Res, D-70569 Stuttgart, Germany
[2] Univ Stuttgart, Inst Met Kunde, D-7000 Stuttgart, Germany
[3] Fraunhofer Inst Mech Mat IWM, D-79108 Freiburg, Germany
[4] Karlsruher Inst Technol KIT, IZBS, D-76131 Karlsruhe, Germany
来源
ZEITSCHRIFT FUR METALLKUNDE | 2002年 / 93卷 / 05期
关键词
thin film plasticity; discrete dislocation dynamics; constrained diffusional creep; in situ TEM; thermal stress;
D O I
10.3139/146.020383
中图分类号
TF [冶金工业];
学科分类号
0806 ;
摘要
Small is strong - the yield stresses of thin metall23ic films with sub-micron thickness greatly exceed bulk values. While it is clear that this effect must be due to confinement effects on dislocation processes, the details of such mechanical finite size phenomena are complicated. Our recent in situ transmission electron microscopy studies combined with discrete dislocation dynamics simulations have shed some light on this problem. One conclusion is that the behavior of dislocations near interfaces affects the plasticity in small volumes in new ways which have not been foreseen by theoretical considerations so far. Another important aspect is the discovery of unexpected slip systems, which can be seen as indirect evidence for a constrained diffusional creep mechanism in polycrystalline films. Discrete dislocation simulations have allowed the operation of dislocation sources to be simulated under various boundary conditions. Based on these studies, we propose a new view of dislocation plasticity in thin films which, while being far from complete, seems to be more consistent with experimental observations and measurements.
引用
收藏
页码:383 / 391
页数:9
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