Finite-element modeling of nanoindentation for determining the mechanical properties of implanted layers and thin films

被引:31
作者
Knapp, JA
Follstaedt, DM
Barbour, JC
Myers, SM
机构
[1] Sandia National Laboratories, MS 1036, Albuquerque
关键词
D O I
10.1016/S0168-583X(97)00034-7
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
The mechanical properties of implanted layers and thin films on dissimilar substrates are difficult to determine accurately. Nanoindentation of the layer provides information, but detailed numerical modeling is required in order to separate the properties of the layer from those of the substrate. We describe here the procedures we have developed to accomplish this modeling with the commercially available finite-element code ABAQUS. Using these techniques, we are able to extract from nanoindentation testing the yield stress, Young's modulus, and hardness of the layer material, with an absolute accuracy of at least 20%. The procedure is applicable to layers as thin as 50 nm on essentially any substrate, hard or soft. We have used it for materials ranging from ion-implanted layers to thin films of metals and dielectrics formed using plasma-deposition methods. An example is given of O-implanted Al, a thin, hard layer on a soft substrate.
引用
收藏
页码:935 / 939
页数:5
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