About the origin and the mechanisms involved in the cracking of highly porous silicon layers under capillary stresses

被引:26
作者
Belmont, O [1 ]
Faivre, C [1 ]
Bellet, D [1 ]
Brechet, Y [1 ]
机构
[1] INST NATL POLYTECH GRENOBLE,THERMODYNAM & PHYSICOCHIM MET LAB,F-38402 ST MARTIN DHERES,FRANCE
关键词
stress; growth mechanism; elastic properties; silicon;
D O I
10.1016/0040-6090(95)08057-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The effects of the capillary stresses during the drying of p + -type porous silicon (PS) layers are reported. The cracking of the PS layers occurs for samples thicker than a critical thickness value h(c). Taking into account the elastic properties ofp + -type PS material, a simple model shows that h(c) varies as (1 - p)(3) and 1/gamma(LV)(2), where p is the porosity and gamma(LV) is the surface tension of the drying liquid. A good agreement with experimental results is observed. This study leads also to a very easy and simple method which increases the h(c) value by a factor of about 25 when using pentane as the drying liquid (instead of water).
引用
收藏
页码:219 / 222
页数:4
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