Maleimide based tetrapolymers for use in lift-off resists

被引：2

作者：

Chen, CX ^{[1
]}

Hurditch, RJ ^{[1
]}

Johnson, DW ^{[1
]}

Nawrocki, DJ ^{[1
]}

机构：

[1] MicroChem Corp, Newton, MA 02464 USA

来源：

ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XIX, PTS 1 AND 2 | 2002年 / 4690卷

关键词：

maleimide copolymers; PMGI; lift-off resists;

D O I：

10.1117/12.474224

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Alkaline soluble maleimide based tetrapolymers which were prepared by free radical copolymerization are found to be suitable for use as non-imaginable resists in multilevel photolithographic processing. These materials offer widely variable undercut rates because of the ability to vary the composition during free radical polymerization and show little or no scumming when used in lift-off resist. This new polymer system may also be used as the base soluble resin in a photoresist formulation or a base soluble antiflective coating composition as well as used in making lift-off resists.

引用

页码：262 / 269

页数：8